金属薄膜和超薄薄膜中厚度测量检测方案(白光干涉测厚)

Film Metrology & More...For further information， please contact us at info@thetametrisis.com or sales@thetametrisis.comThetaMetrisis C 2019， www.thetametrisis.com ThetaMetrisis APPLICATION NOTE #034 Thickness measurements of thin and ultra-thin metallic films Introduction： Film thickness is of vital importance for the performance of the coatings and in particular for thethin and ultrathin films. Therefore it is important to employ very accurate and non-destructive methodologiesfor the characterization of such films. Optical methods for thickness determination of films offer the advantageof being noncontact， nondestructive， fast， precise， sensitive and reproducible. In this application note wemeasure the thickness of metallic thin and ultra-thin films using FR-Tools. Means & Methods： Samples under investigation were thin films of iridium and gold on top of Si wafer. Thosefilms were deposited in a wide thickness range by standard sputtering tools. The characterization of the filmswas done through specular reflectance measurements by a ThetaMetrisis FR-pRo UV/VIS tool， operating at the280-700nm spectral range. Results： In the UV/VIS spectral range， metals present high absorbance and the maximum film thickness that canbe measured is material dependent several tens of nanometers. For example the maximum film thickness forsome metals is presented in the table below. Metal Max thickness (nm) Metal Max thickness (nm) Al 30nm Au 50nm Ti 40nm lr 45nm Pt 35nm Typical experimental reflectance spectra (black line)， and fitted reflectance spectra (red line) as recorded by theFR-Monitor software， for both Au and Ir films， are illustrated in the figures below. Fle Procesting Ui Fie Edt View ecessing Utizies uso Figure 1： Experimental and fitted reflectance spectra of Irultra-thin film on top of Si at 280-420nm spectral range.The thickness was measured 4.2nm. Figure 2： Experimental and fitted reflectance spectra of Authin film on top of Si at 280-420nm spectral range. Thethickness was measured 6.8nm. ie tat Vew Flle tat Frocereing Utiner Heip Figure 3：Experimental and fitted reflectance spectra ofIrultra-thin film on top of Si at 280-500nm spectral range.The thickness was measured 8.2nm. Figure 4： Experimental and fitted reflectance spectra of Authin film on top of Si at 300-700nm spectral range. Thethickness was measured 12.3nm. 薄和超薄金属薄膜的厚度测量简介：薄膜厚度对涂层的性能，特别是薄膜和超薄薄膜的性能至关重要。因此，采用非常精确和无损的方法来表征此类薄膜是非常重要的。薄膜厚度的光学测定方法具有非接触、无损、快速、准确、灵敏、重现性好等优点。在本应用说明中，我们使用FR工具测量金属薄膜和超薄薄膜的厚度。方法和手段：研究样品是在硅片表面镀上铱和金的薄膜。这些薄膜是用标准溅射工具在很宽的厚度范围内沉积的。利用FR-pRo紫外/可见分光光度计，在280-700nm的光谱范围内对薄膜进行了镜面反射测量。结果：在紫外/可见光谱范围内，金属呈现高吸光度，可测量的最大膜厚为几十纳米的材料。例如，一些金属的最大膜厚在下表中给出。结论：用FR工具成功地测量了Si表面超薄金属层和薄金属层的厚度。利用XRR技术对厚度测量结果进行了鉴定。FR工具是一种经济、无损的测量超薄金属薄膜厚度的方法。FR的工具基于白光反射光谱(Reports) 。准确同步的厚度测量及薄膜的折射率-一个广泛的多样化的应用范围广泛的光电特性的工具和整体解决方案，如:半导体、有机电子、聚合物、涂料和涂料、光伏、生物传感、化学传感...