研发型纳米压印+上海螣芯科技+GL4（GL6）

Multi-functional NIL machine for R&D

 斜光栅、DOE、AR纳米压印

?Multi-function NIL machine for R&D and small

volume production

?Easy switch between different NIL configurations,

flxibilities for R&D

?Functions: High resolution NIL on spin-coated

substrates, Puddle dispensed NIL for Micro

molding processes, NIL on curved or spherical

surfaces

GL6/8/12 CLIV

High resolution NIL machine for mass production

?NIL machine equipped with GermanLitho patented

CILV technology for mass production

?NIL on spin-coated substrates for high resolution

and high aspect ratio nanostructures

?Automatic working stamp replication, imprinting

and demolding processes, excelent imprint

uniformity over large area

?Better than 40nm resolution, 10:1 aspectration,

20nm residual layer thickness

GL8 MLA

NIL machine for microlens array production

?Mass production NIL machine for micro-molding of

microlens array or diffuser processes

?Automatic working stamp replication, imprinting

and demolding processes, resist dispense

integrated

?Active control of gap and parallelism between

stamp and substrate, excelent TTV

?Alignment for wafer stacking processe