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HORIBA UVISEL Plus研究级经典型椭偏仪
HORIBA UVISEL Plus研究级经典型椭偏仪

HORIBA UVISEL Plus研究级经典型椭偏仪

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HORIBA（中国）
  • 白金
  • 第22年
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仪器简介：
 椭圆偏振光谱是一种无损无接触的光学测量技术，基于测量线偏振光经过薄膜样品反射后偏振状态发生的改变，通过模型拟合后得到薄膜、界面和表面粗糙层的厚度以及光学性质等等，可测厚度范围为几埃至几十微米。此外，还可以测试材料的反射率及透过率。

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技术参数：

       * 光谱范围: 190-885 nm（可扩展至2100nm）
       * 微光斑可选50μm-100μm-1mm
       * 探测器：分别针对紫外，可见和近红外提供优化的PMT和IGA探测器
       * 自动样品台尺寸：多种样品台可选
       * 自动量角器：变角范围40° - 90°，全自动调整，小步长0.01°

主要特点：
       * 50KHz 高频PEM 相调制技术，测量光路中无运动部件
       * 具备超薄膜所需的测量精度，超厚膜所需的高光谱分辨率
       * 具有毫秒级超快动态采集模式，可用于在线实时监测
       * 自动平台样品扫描成像、变温台、电化学反应池、液体池、密封池等多种附件
       * 配置灵活  


相关方案

综合材料半导体电子/电气生物产业其他
  • 并五苯有机薄膜晶体管中厚度检测方案(椭偏仪)
    Spectroscopic Ellipsometry based on the liquid crystal devices is an excellent technique for the highly accurate characterization of organic semiconductor in OTFTs device in the visible range.

    材料 2016-09-22

  • TiO2薄膜和多层减反膜中厚度，光学常数检测方案(椭偏仪)
    Owing to the sensitivity of the MM-16 Spectroscopic Ellipsometer and the advanced modeling features included in the DP2 software, this note describes the successful characterisation of complicated anti-reflective structures. Accurate and simultaneous determination of thickness and optical properties have been performed in the visible range. Similar analyses have been applied to other high-k material such as Ta2O5 / glass, Al2O3 / 3*{A2O3/a-Si} / GaAs, SiO2 / 2*{HfO2 / SiO2) / glass.

    材料 2016-09-21

  • ZnO薄膜中光学常数检测方案(椭偏仪)
    The sensitivity of Spectroscopic Ellipsometry is such that characterisation of different doping concentrations of Al in ZnO is possible. Further to this the UVISEL PMSE allows the highest sensitivity and precision of the ellipsometric angles across the full range [0°, 360°], even when ' is close to 0°, and this performance is essential when characterising thin transparent films

    材料 2016-09-21

  • 玻璃和预蒸镀基底中光学常数检测方案(椭偏仪)
    The deposition conditions have generated inhomogeneous porous layers that have been observed by the UVISEL Spectroscopic Phase Modulated Ellipsometer. Moreover, the spectroscopic measurements allow determination of the small discrepancies between the optical constants of a Y2O3 film grown at bare substrate and the one grown on a ZrO2 film.

    材料 2016-09-21

  • AIN中光学特性检测方案(椭偏仪)
    The feasibility of using the MM-16 SE in measuring thickness and refractive index of AlN thin and thick films has been demonstrated. Non destructive measurement of thickness was successfully applied to films as thick as 3μm deposited on Si. The multi-layer models with a surface layer with void and the simple dispersion gave useful information about surface roughness, film density and oxygen contamination.

    半导体 2016-09-22

  • III-V族半导体中厚度，光学常数检测方案(椭偏仪)
    The high accuracy characterisation of the thicknesses and optical properties of III-V semiconductors has been successfully performed using the UVISEL Spectroscopic Phase Modulated Ellipsometer. Moreover, Spectroscopic Ellipsometry can be applied to characterise multilayers of miscellaneous binary, ternary semiconductors and alloys (MQW structure, PIN structure, pump laser, laser semiconductor,…).

    半导体 2016-09-22

  • 有机半导体中光学常数检测方案(椭偏仪)
    When compared with other optical metrology instruments the unique strengths of spectroscopic ellipsometers are based on their highly precise and simple experimental measurements plus physical and material information derived from optical constants characterization.

    半导体 2016-09-22

  • 封装应用中的势垒层中过程控制检测方案(椭偏仪)
    The UVISEL FUV combines high-speed acquisition, high accuracy and versatility with a straightforward recipe mode for automated tasks. This powerful combination allows the UVISEL spectroscopic ellipsometer to be used for monitoring the production of barrier coatings for packaging applications in real time.

    半导体 2016-09-21

  • 铁电薄膜PbZr1-xTixO3&BA1-xSrxTiO3中厚度，光学常数，各向异性检测方案(椭偏仪)
    Spectroscopic ellipsometry is a powerful technique to characterize the thickness and optical constants of complex ferroelectric stacks with high accuracy and precision. Specific modelling features in this study include the characterization of the anisotropic sapphire substrate, rough overlayer and layer inhomogeneity with depth.

    电子/电气 2016-09-22

  • AlxGa1-xNGaN中厚度，光色散检测方案(椭偏仪)
    Liquid Crystal Modulation Spectroscopic Ellipsometry is an excellent technique for the highly accurate characterization of the compound semiconductor heterostructure AlGaN / GaN. Using the MM-16 spectroscopic ellipsometer it is a straightforward procedure to determine the film thickness and optical dispersions of the complete structure even where the film is several microns thick. The detailed knowledge of the optical parameters of AlGaN alloys is crucial for example for the design of opto-electronic devices. Furthermore, from the optical parameters a calibration curve could be constructed to provide a rapid and efficient determination of the Al content in the AlGaN layers. Thus Spectroscopic Ellipsometry also proves a non-destructive technique for AlGaN alloy composition determination. This method can be equally applied to other compound semiconductors such as SiGe, II-VI semiconductors or classical III-V semiconductors.

    电子/电气 2016-09-22

  • 纳米级厚度的高k介电材料中厚度，光学常数，纳米级尺寸的界面检测方案(椭偏仪)
    Optical characterization techniques proved to be complementary to optimize highmaterials used in microelectronic applications. This note shows that the VUV wavelength range of the UVISEL Phase Modulated Ellipsometer is particularly suitable for the accurate characterization of high-K film thickness and interfaces with nanoscale dimensions as well as optical properties and bandgap.

    电子/电气 2016-09-22

  • GeSb膜中厚度，光学常数检测方案(椭偏仪)
    Spectroscopic ellipsometry is a powerful technique for high accuracy characterization of the thickness and optical constants of GeSbTe multilayer systems for rewritable optical disc applications. It was shown that measurement in the NIR range gives better accuracy for the analysis of these types of material. The use of the multiple sample analysis reduces parameter correlations and errors for the thinnest layers. Owing to the advanced modelling features included in the DeltaPsi2 software, it is a straightforward procedure to analyze such structures even with layers deposited on both sides of the substrate.

    电子/电气 2016-09-22

  • 生物素中生物膜厚度，界面反应检测方案(椭偏仪)
    This application note illustrates the suitability of the UVISEL Spectroscopic Phase Modulated Ellipsometer as a very accurate instrument for studying solid/solid or solid/liquid interface reactions, and measurement of biofilm thickness.

    生物产业 2016-09-15

  • 流动液体池环境中的生物芯片中生物芯片结构检测方案(椭偏仪)
    Interpretation of this behaviour is not fully understood, but it is likely to be due to the ionic interaction between the DNA and the buffer solution. A natural negative charge on the DNA fragments means that in a neutral environment, such as water, their preferred orientation would be for the molecules to lay on the gold layer with no preferred orientation. When the buffer solution is added there is an interaction with the positive ions in the solution, and the DNA fragments stand up leading to an increase in layer thickness.

    生物产业 2016-09-15

  • 溶液中疏水改性多聚糖在气水界面的聚集检测方案(椭偏仪)
    This interpretation has been supported by both surface tension measurement for the liquid phase and fluorescence spectroscopy for bulk behaviour. From this study there is clear evidence that increasing the substitution rate from 10% to 35% induces a reinforcement of the hydrophobic interactions and thus the formation of more compact and stable aggregates which can complex hydrophobic compounds. The use of CMP 35% C8 could be envisaged in drug formulations where dispersion of a hydrophobic drug in an aqueous phase is required.

    生物产业 2016-09-15

  • DNA传感器垫片中膜厚检测方案(椭偏仪)
    The sample data is summarised in the figure. The thickness of the DNA sensor pad was found to be of the order of 20 ?. This is consistent with the preparation of a layer of single molecular thickness as expected. The pads characterised had a variety of shapes. The example chosen here had a ring shape. The area covered by the analysis is 50 mm x 20 mm.

    生物产业 2016-09-15

  • 电致变色器件中表面粗糙度，界面层检测方案(椭偏仪)
    The UVISEL Spectroscopic Ellipsometer is a powerful instrument for characterizing complete EC devices with high accuracy and reliability, and provides information on surface roughness or interface layers along with their composition.

    其他 2016-09-21

  • 阳极氧化铝表面中光学常数检测方案(椭偏仪)
    The aluminium anodised layer has been successfully characterised by the MM-16 Spectroscopic Ellipsometer with very high speed and accuracy.

    其他 2016-09-21

  • 椭圆偏振光谱仪的标准应用
    Ellipsometry is a very versatile optical technique that has applications in many different fields, from the micro electronics and semiconductor industries (for characterizing oxides or photoresists on silicon wafers, for ex ample) to biology. This very sensitive measurement technique provides unequalled capabilities for thin film metrology, and has the advantage that it is non-destructive as it uses polarized light to probe the dielectr properties of a sample.

    其他 2014-06-09

  • ellipsometer application for PDP - Plasma Display Panel
    采用UVISEL相调制型椭圆偏振光谱仪可以对PDP结构样品进行分析,得到结构中各层的厚度、折射率的变化.

    其他 2004-08-02

相关仪器 相关资料
  • HORIBA UVISEL相位调制型椭圆偏振光谱仪

    UVISEL相位调制型椭圆偏振光谱仪是基于25年经验研制而成的杰作，它具有无可比拟的高精度、高分辨率、优异的信噪比、长期的稳定性（UVISEL所实现的长期稳定性无需频繁校准），是纳米/微米级结构研究的理想工具。

    1444MB 2017-12-12
  • HORIBA UVISEL相位调制型椭圆偏振光谱仪

    UVISEL相位调制型椭圆偏振光谱仪是基于25年经验研制而成的杰作，它具有无可比拟的高精度、高分辨率、优异的信噪比、长期的稳定性（UVISEL所实现的长期稳定性无需频繁校准），是纳米/微米级结构研究的理想工具。

    1444MB 2017-11-15
  • AUTO SE & SMART SE 椭圆偏振光谱仪 - 中文样本

    Auto SE是一种新型的按键式全自动薄膜测量分析工具，仅需简单的几个按键操作，即可完成全自动测量和分析。仅几秒钟即可完成样品分析，并提供完整的样品堆叠特性报告-包括薄膜厚度、光学常数、表面粗糙度和薄膜的不均匀性。

    2413MB 2015-11-13
  • 相调制椭偏仪原理简介

    Jobin Yvon公司采用光电调制技术生产的UVISLE， MM16椭偏仪，在精度，稳定性等方面达到了一个新的水平。文章主要说明了电光调制型椭偏仪的工作原理和特点。

    951MB 2006-01-12
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