MCL特高压纳米位移台UHV100
MCL特高压纳米位移台UHV100

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Nano-UHV100

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美洲

  • 金牌
  • 第17年
  • 授权经销商
  • 营业执照已审核
核心参数


Features
  • UHV compatible construction

  • Two axis (XY), large aperture

  • 100 μm x 100 μm ranges of motion

  • Bakeable to 100° C

  • Titanium or invar construction

  • Closed loop control



Typical Applications
  • X-ray, VUV, and optical microscopy

  • Surface metrology

  • UHV atomic scale microscopy

  • Special designs - just contact us with your requirements




Product Description

The Nano-UHV100 is a two axis UHV compatible nanopositioning stage constructed from titanium or invar. Made entirely from UHV compatible materials, the Nano-UHV100 can be baked to 100°C for vacuum applications in the 10-10Torr range. The large (2.6” x 2.6”) center aperture makes the Nano-UHV100 ideal for vacuum microscopy applications. Internal position sensors utilizing proprietary PicoQ® technology provide absolute, repeatable position measurement with picometer accuracy. Cable lengths and connectors are customized for the actual installation. Connector wiring is compatible with Accu-Glass Products electrical feedthrough flanges - compatibility with other types of flanges may be requested.

Note: Customized UHV stages are always welcome - just email or call to discuss your special requirements.



Technical Specifications

Range of motion (X)100 μm
Range of motion (Y)100 μm
Resolution (XY)
0.2 nm
Resonant Frequency (X)500 Hz ±20%
Resonant Frequency (Y)250 Hz ±20%
Stiffness1.0 N/μm
θ roll, θ pitch (typical)≤1 μrad
θ yaw (typical)≤3 μrad
Recommended max. load (horizontal)*0.5 kg
Recommended max. load (vertical)*0.2 kg
Body MaterialInvar or Titanium
ControllerNano-Drive®
* Larger load requirements should be discussed with our engineering staff.



Additional Information

Nano-UHV100 Drawing

Nano-UHV100 Catalog Pages



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