PIONEER Two 电子束光刻机

SEM imaging meets electron beam lithography

PIONEER Two is the ideal solution for all universities and scientists who require both an Electron Beam Lithography (EBL) system and an analytical Scanning Electron Microscope (SEM) in equal measure. The concept of the PIONEER Two defines a new and unique class of instruments and is the first true EBL/SEM-hybrid available. With features such as

• cutting-edge integrated thermal-field emission (TFE, Gemini column) technology

• various detectors (ET-SE, inlens SE, inlens EsB, AsB, EDX ...) for optimum EBL mark registration, SEM imaging and SEM analysis

• modern highest-precision laser interferometer controlled stage

• “Write and View” configuration (“on board” sample rotation tilt module)

• modularity and best price/performance ratio for all research budgets, and

• compact system architecture with compact footprint,

the PIONEER Two integrates all the highest-performance ingredients for professional EBL and SEM imaging into a single complete turnkey system. Versatility, robustness, and user-friendliness make PIONEER Two suitable for all those not only seeking to “print” and re-inspect their nanostructures, but also wanting to access an analytical tool with capabilities for SEM imaging and chemical or structural analysis in materials or life sciences.