Raith150 TWO 高分辨电子束光刻系统

E-beam writer with ultra high resolution and thermal shield

The RAITH150 Two has established itself as a bestseller among universal high-resolution Electron Beam Lithography systems. It is utilized in research and nanotechnology centers worldwide and has proven its robustness in 24/7 use. The RAITH150 Two e-beam writer is designed to help with the transition from single-device-oriented research towards small-batch fabrication of nanodevices, thus bridging the gap between academic and industrial R&D with respect to its capilities in rapid prototyping of devices for industrial applications.

With features such as

• ultra-high-resolution Electron Beam Lithography

• automated waferscale e-beam writing

• 30 kV Gemini column technology

• low kV exposure and imaging

• thermal shield, and unique split room setup,

the RAITH150 Two can expose structures smaller than 5 nm and works with sample sizes from a few mm up to 8-inch wafers.

With its low kV imaging capabilties, the RAITH150 TWO e-beam writer also allows for surface-sensitive high-resolution inspection and process control. Exploiting all software functionalities for SEM imaging and dimensional metrology, the device optimization process can be efficiently shortened using the same tool as for device fabrication.