高放大倍数高分辨率校准标样

Period: 70nm pitch nominal, one dimensional array. Accuracy is +/- 0.25nm. Calibration certificate will give the actual pitch of the standard.
Surface structure: Silicon Dioxide ridges on Silicon, 4x3mm dimensions. Ridge height and width are both about 35nm (not calibrated).
Usability: The calibrated pattern covers a 1.2 x 0.5mm area. There is sufficient usable area to make thousands of measurements without reusing any areas contaminated or altered by previous scans.
AFM: Use in contact, tapping and other modes with image sizes from 100nm to 3um. Mounted on a 12mm steel AFM disk.
SEM, Auger, FIB: Can be used for a wide range of accelerating voltage (1kV-20kV) and calibrates images from 25kX to 1000kX. Can be supplied unmounted or mounted on an SEM stub of your choice.
Certification: There is a version with a non-traceable manufacturer’s certificate stating average pitch, based on batch measurements.
There is also the traceable, certified version measured in comparison with a standard calibrated at PTB (Physiklisch-Technischen Bundesanstalt in Braunschweig, Germany, is the German counterpart of NIST). The standard is NIST traceable by virtue of the mutual recognition agreement by NIST and