会议通知｜第九届硬X射线光电子能谱国际会议

硬 X 射线光电子能谱 (常见缩写HAXPES, HXPS, HX-PES, ...) 已经发展成为一种重要的分析技术，通过使用能量从 2 keV 到 15 keV 的 X 射线来研究各种材料的电子结构，这使XPS探测深度可以从10nm扩展到30nm。

ULVAC-PHI 应用科学家张薰勻博士受邀参加本届HAXPES研讨会，将以“Accurate and Non-destructive Layer Structure Analysis of Semiconductor Materials Using Angle Resolved HAXPES”为主题，介绍HAXPES在半导体材料无损膜层结构深度分析中的应用。

• The 1st Int. Workshop, HAXPES2003, Sep. 11-12, ESRF at Grenoble

• The 2nd Int. Workshop, HAXPES2006, Sep. 19-20, SPring-8 at Harima

• ALS Satellite Worhshop 2008 (ALS User's meeting), Oct. 14-15, ALS at Berkeley

• BEESY Satellite Workshop 2008, Dec. 8, BESSY at Berlin

• The 3rd Int. Workshop, HAXPES2009, May 20-22, BNL at Brookhaven

• SOLEIL Satellite Workshop 2010, Jan. 18-19, SOLEIL at France

• The 4th Int. Workshop, HAXPES2011, Sep. 14-16, DESY at Hamburg

• The 5th Int. Conf., HAXPES2013, Jun. 17-20, Uppsala University, at Uppsala

• The 6th Int. Conf., HAXPES2015, Mar. 30 - Apr. 3, NSRRC at Hsinchu

• The 7th Int. Conf., HAXPES2017, Sep. 11-15, Berkeley

• The 8th Int. Conf., HAXPES2019, Jun. 3-6, Sorbonne Univerity at Paris

本次参会信息请点击原文：

http://rsc.riken.jp/haxpes2022/index.html

https://www.ulvac-phi.com/en/events/2022/haxpes-2022/