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当前位置: 日立科学仪器 > 扫描电镜(SEM) > 聚焦离子束&电子束装置NB5000

聚焦离子束&电子束装置NB5000

品牌:
产地: 日本
型号: NB5000
报价: 面议
产品介绍

Hitachi's high performance FIB-SEM provides unparalleled nano-analyses of devices and functional materials !!

Legendary Hitachi reliability and performance in an integrated system (Ultra-high performance FIB and high resolution FE-SEM) enabling high-throughput specimen preparation, high resolution imaging and analysis and precision nanofabrication. New low-damage fabrication techniques have been developed for materials sensitive to electron irradiation. Innovations in sample loading, sample navigation, and Micro-sampling increase analysis efficiency(*1)


Features

Ultra-high performance FIB

  • Low CsFIB optics(*2) deliver 50nA or more of beam current (@40kV) in an about 1µm spot-size. The high current enables unconventional large-area milling, hard material fabrication and high throughput multiple specimen preparation.

New Micro-sampling

  • Hitachi's patented Micro-sampling technology provides smooth probe motion. Also, the probe can be used for newly developed absorbed current imaging(*1) to aid fault isolation.

High precision end-point detection

  • High resolution SEM allows high precision end-point detection. Section-view function, which displays an outline of the cross-section utilizing the real-time FIB image, is ideal for preparing electron irradiation sensitive specimens like low-K material.

High resolution SEM

  • Hitachi's unparalleled SEM column and detector design(*2) enables high resolution SEM imaging during and after FIB fabrication.

Holder compatibility with TEM/STEM(*1)(*2)

  • A side entry STEM/TEM-type staqe(*1) allows the use of the same specimen holder (compatible with NB5000 and Hitachi TEM/STEM). No tweezer handling of specimen during transfer results in higher throughput TEM/STEM analysis.

(*1):Optional accessory
(*2):Hitachi patent
Low Cs FIB optics: patent pending, Micro-sampling: JP2774884/US5270552, Section-view function: patent pending, SEM column and detector design: JP3081393/US5387793, Holder compatibility: JP2842083

Specifications

FIB Accelerating voltage 1 - 40kV
Beam current 50 nA or more @ 40kV (CP)
SIM resolution 5nm @ 40kV (CP)
Magnification ×60 - ×250,000
Ion source Ga Liquid Metal Ion Source
Lens system Low Cs 2-stage electrostatic lens system
SEM Accelerating voltage 0.5 - 30kV
SEM resolution 1.0nm @ 15kV (CP)
Magnification High Mag mode ×250 - ×800,000
Low Mag mode ×70 - ×2,000
Electron source ZrO/W Schottky emission
Lens system 3-stage electromagnetic lens reduction system
Signal selection SEM Upper SE, Lower SE, Absorbed current(*1)
FIB Lower SE, Absorbed current(*1)
Eucentric stage Traverse range X: 50mm (30mm(*2)),
Y: 50mm (30mm(*2)), Z: 22mm
T: -1.5 - 58.3°, R: 360°
Sample size Maximum diameter Φ50mm (Φ30mm(*2))
Deposition Material Tungsten/Carbon (changeable)
Micro-sampling Probe exchange Load lock type
Additional function Touch sensing, Absorbed current imaging(*1)
 

CP:Beam Cross Point

(*1):Optional accessory
(*2):When side entry stage is ordered
 

相关方案

更多

NX2000(FIB-SEM-Ar)三束在单晶铁与单晶硅透射电镜样品制备中的应用

日立高新公司,整合了高性能FIB技术和高分辨SEM技术,再加上加工方向控制技术以及Triple Beam(选配)技术,推出了新一代产品NX2000。运用高对比度,实时SEM观察和加工终点检测功能,可制备厚度小于20 nm的超薄样品。加工方向控制技术(Micro-sampling系统(选配)+高精度/高速样品台*)对于抑制窗帘效应的产生,以及制作厚度均一的薄膜类样品给予厚望。Triple Beam(选配)可提高加工效率,并能高效的消除FIB损伤。

半导体

2019/05/30

工商信息

企业名称

日立科学仪器(北京)有限公司

企业信息已认证

企业类型

有限责任公司(台港澳法人独资)

信用代码

91110105MA01F0W46B

成立日期

2018-10-10

注册资本

人民币元1000万元

经营范围

批发机械设备、仪器仪表、电子产品、1类医疗器械;维修机械设备、仪器仪表、电子产品、I类医疗器械;技术咨询;租赁建筑工程机械与设备、仪器仪表;货物进出口、技术进出口、代理进出口(涉及配额许可证管理,专项规定管理的商品按照国家有关规定办理);企业管理咨询;经济贸易咨询。(市场主体依法自主选择经营项目,开展经营活动;依法须经批准的项目,经相关部门批准后依批准的内容开展经营活动;不得从事国家和本市产业政策禁止和限制类项目的经营活动。)

联系方式
日立科学仪器(北京)有限公司为您提供聚焦离子束&电子束装置NB5000,nullNB5000产地为日本,属于扫描电镜(SEM),除了聚焦离子束&电子束装置NB5000的参数、价格、型号、原理等信息外,还可为您提供更多扫描电镜(SEM),日立科学仪器客服电话400-803-2799,售前、售后均可联系。
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