CVD 2x2 inches multilayer hBN CVD铜基多层氮化硼薄膜

Multilayer h-BN (Boron Nitride) film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms. Our h-BN CVD process has been adopted in order that defect density has been kept low (~1E10-1E11 cm-2) and single domain sizes have been increased to reduce 1D grain boudary defect concentrations. Multilayer h-BN sheets measure ~5cm x 5cm or ~2x2 inches in size.

Properties of h-BN

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除供应CVD 2x2 inches multilayer hBN CVD铜基多层氮化硼薄膜外，上海巨纳科技有限公司还可为您提供基于蓝宝石衬底的全区域覆盖的单层二硫化钨、基于铜基的多层氮化硼薄膜（5*2.5cm）、n-type MoS2 crystals N型二硫化钼晶体 等产品，公司有专业的客户服务团队，是您值得信赖的合作伙伴。