POLOS 激光直写光刻机Maskless lithography

Maskless lithography offers a convenient way to create nanopatterns without the use of slow and expensive photomasks. This is particularly useful for research and rapid prototyping purposes. The POLOS^® Beam is a budget compact solution that brings these benefits to your desktop without compromising on performance.

The POLOS^® Beam Engine is a quick-swappable component that uses a UV laser beam to create a precise spot that can expose any pattern on a photoresist. To expose large wafers, precision steppers move the wafer, and multiple exposures are stitched together. The POLOS^® Beam Engine can produce features smaller than (CD) 0.8 μm on a 5" wafer when equipped with a 405nm Engine and 20x objective.

Compact

Full-featured maskless lithography, smaller than a desktop computer.

Powerful

Sub-micron resolution while exposing a write field in less than two seconds.

Ultrafast Autofocus

Piezo-actuators reach focus in less than a second when combined with our close- looped focus optics.

No-fuss Multilayer

Semi-automatic alignment allows multilayer alignment to be completed within minutes.

The included software makes quick work of any patterning job; just load, align and expose. Navigation is similar to CNC systems.