PE-2000R工业化卷对卷等离子处理系统
PE-2000R工业化卷对卷等离子处理系统

¥100万 - 150万

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Plasma Etch

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PE-2000R

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美洲

  • 银牌
  • 第11年
  • 一般经销商
  • 营业执照已审核
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PE-2000R Industrial Reel-to-Reel Plasma Processing System

The PE-2000R roll to roll plasma system is specially fitted with a continuous feed drive and take-up system to accommodate continuous flexible substrates and roll/reel mounted materials. Our reel-to-reel plasma system can accept web widths of 2” to 24” with spindle diameters of 10”. 

Tension control is accomplished by a pivoting arm 3 inches in diameter in contact with the web in the process chamber coupled to a counterweight system outside the chamber isolated by a magnetic fluid feedthrough. It is actively controlled by the subsystem transport control. 

Virtually any tension can be set by changing the external counter weights outside the chamber. Edge tracking and control is optically detected and is automatically controlled by a closed-loop servo motor mechanism bellows, isolated from the process. The actuator is outside the chamber.


To purchase a PE-2000R, please contact us at or email us at .


Standard Features

Electrode Configuration

Vertical, Planar 4 Level, 24” W x 36”L, 72” total process area will allow 1 meter per minute

Generator

2500W 13.56MHz Continuously Variable Power Supply with Automatic Matching Network

Gas Control

Three 0-2000cc Mass Flow Controllers with Low Gas Source Alarm and Multiple Gas Selection

Control System

Color PLC-Based Touch Screen Control Interface

Vacuum Pump

 

2-Stage Dry Pump (Oxygen Service – Krytox Charged)

Vacuum Gauge

1-2000 mT

Chamber Material

6061-T6 Aluminum

Unit Dimensions

120"x45”x79”

Additional Accessories

Fume Scrubber

Air Dryer for Purge Gas Generation

Automatic Nitrogen Pump Purge System

Controlled Rate Nitrogen Chamber Purge System

Signal Light Tower

Temperature Control System

Made in the U.S.A.

Optional Features

Most systems can be customized with a wide range of options including:

Custom Sized Vacuum Chamber, Number/Size of Electrodes

To ensure your system is able to specifically meet your throughput requirements

Larger MHz Power Supplies with Automatic Matching Network

Higher watt/frequency power supplies

PC-based Control System

For fully automatic system control, multi-step process sequencing, multiple recipe storage, data logging/trending, events/alarms, etc.

Temperature Control System

To maintain specific temperatures in the processing chamber for enhanced uniformity and application-specific needs

Dry and Oil-Driven Vacuum Pumps and Blower Boosters

A variety of vacuum pump options for more control over the process chamber pressure

Chiller System for Dry Vacuum Pump

Necessary for the operation of a dry vacuum pump

Chamber and Vacuum Pump Purge Systems / Air Dryer / Purge Gas Generator

To ensure thorough removal of contaminants from operating equipment, providing uniformity and increasing longevity

Vacuum Pump Oil Mist Eliminator

Captures oil from vacuum pump exhaust

Vacuum Pump Oil Filtration

Filters the vacuum pump oil down to a 3 micron level which increases the longevity of the oil and the vacuum pump

Automatic Vacuum Control

Provides automation of the process chamber pressure

Additional Digital Mass Flow Controllers

Provides digital automation and monitoring of process gases

Software Configurable Gas Steering Matrix

Designed to allow for up to 5 process gas inputs; 3 are selectable at any time by software driven controls

Low Gas-Source Alarm

Notification for when your process gas container needs replenished

Light Tower

For easy visualization of the steps of the plasma processing sequence

Fume Scrubber

To eliminate hazardous fumes/contaminants from the chamber/vacuum pump exhaust

Facility Requirements

Electrical

120/208 VAC, 50/60 Hz, 3 Phase, 5 Wire 100 Amps

Compressed Air Service

80-100PSI, 0.5CFM

Regulated Process Gases

25-30PSI

Closed Loop Chilled Water Source


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