显影液RD6
显影液RD6

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RD6

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美洲

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RD6
Resist Developer RD6 is a water-based, metal ion free resist developer for application with
Negative Resists NR1, NR5, NR7 and NR9 series and Positive Resist PR1 series.
Properties
♦ Principal solvent: water
♦ Tetramethylammonium hydroxide content (%): 2.25-2.30
♦ Appearance: clear liquid
♦ Specific gravity at 25°C (g/cm³): 0.99-1.01
♦ Guaranteed shelf life at 25°C storage (years): 3
Processing
1 Pour the developer solution into the resist development tank.
2 Establish that the temperature of the developer is correct.
3 Develop the resist by immersion or spraying, following the instructions in the ‘processing’
section of the technical information for the resist.
4 Rinse the substrate in deionized water until the water resistivity reaches the prescribed
limit.

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