正性光刻胶PR1-9000A

PR1-9000A
Positive Resist PR1-9000A is a positive tone photoresist designed for 365 or 436 nm wavelength
exposure, using tools such as wafer steppers, scanning projection aligners, proximity printers and
contact printers. PR1-9000A excels in applications when superior adhesion is required. Use of
adhesion promoters, such as HMDS is not recommended with PR1-9000A.
The following are advantages of PR1-9000A over other resists:
- superior resolution capability
- fast photospeed
- superior linewidth control due to suppression of reflective notching
- substrate adhesion which is superior to that of any commercial positive resist
- ease of removal after RIE process
- shelf life exceeding 1 year at room temperature storage.
The formulation and processing of PR1-9000A were designed with regard to occupational and
environmental safety. The principal solvent in PR1-9000A is 1-methoxy-2-propanol and
development of PR1-9000A is accomplished in a basic water solution.
Properties
♦ Solids content (%): 43-47
♦ Principal solvent: 1-methoxy-2-propanol
♦ Appearance: light yellow liquid
♦ Coating characteristic: very uniform, striation free
♦ Film thickness information:
Coating spin speed,
40 s spin (rpm)
Film thickness after 115°C hotplate
bake for 6 min (nm)
800 17100-18900
2000 11276-12463
3000 8550-9450
4000 7738-8552
5000 6716-7423
♦ Sensitivity (mJ/cm² for 1 μm thick film):
365 nm exposure wavelength: 70
436 nm exposure wavelength: 40
♦ Guaranteed shelf life at 25°C storage (years): 2
Processing
1 Application of resist by spin coating at selected spin speed for 40 s.
2 Application of Edge Bead Remover EBR1 to bottom and edge of the coated wafer for 10s, until
5 s before completion of spin cycle.