氮化硅窗口
氮化硅窗口Silicon Nitride Window Grids 氮化硅TEM窗口在恶劣的实验室条件下表现良好,硅材料的框架100μm厚,适合标准的3mm支架和大多数双倾斜样品台,氮化硅窗口装在透明的凝胶盒中。l 等离子可清洗-可以耐受强力等离子清洗,移去有机污染层l 场到场的均匀性-整个薄膜厚度的变化小于0.5 nml 可容忍1000°C以上的温度-支持在高温下观察动态过程中使用l 经得起严酷的条件-提供理想的成像分辨率,化学稳定性和机械强度l 氮化硅采用LPCVD法制造,具有平坦,绝缘和疏水表面选择参考High Resolution Imaging:5nm76042-43, 1 square (25x25μm)76042-44, 9 squares (50x50μm)76042-45, 2 slots (50x1500μm)*Robust, Increased High Resolution:10nm76042-46, 9 squares (100x100μm)Everyday Imaging:20nm76042-49, 1 square (500x500μm)76042-50, 9 squares (100x100μm)Demanding Conditions:50nm76042-53, 1 square (100x100μm)76042-52, 1 square (500x500μm) 76042-51, 1 square (1000x1000μm)76042-50, 9 squares (100x100μm)Materials & Cryo-EM Suspension:Microporous76042-41, 1 square (500x500μm)76042-40, 1 square (500x500μm)*Coated with 1 nm of ultrahigh purity carbon to minimize charging产品选购:货号产品描述窗口尺寸厚度规格76042-40Silicon Nitride Microporous TEM Window Grid (2.0 μm pores with labeled grid)500μm sq.20nm10/pk76042-41Silicon Nitride Microporous TEM Window Grid (2.0 μm pores with labeled grid)500μm sq.50nm10/pk76042-42Silicon Nitride Nanoporous TEM Window Grid500μm sq.20nm10/pk76042-43Silicon Nitride TEM Window Grid25μm sq.5nm10/pk76042-44Silicon Nitride TEM Window Grid(8) 50μm sq., (1) 50x100μm 5nm10/pk76042-45Silicon Nitride TEM Window Grid(2) 50x1500μm5nm10/pk76042-46Silicon Nitride TEM Window Grid(8) 100 sq., (1) 100x350μm10nm10/pk76042-47Silicon Nitride TEM Window Grid(8) 250 sq., (1) 250x500μm10nm10/pk76042-48Silicon Nitride TEM Window Grid(8) 100 sq., (1) 100x350μm20nm10/pk76042-49Silicon Nitride TEM Window Grid500μm sq.20nm10/pk76042-50Silicon Nitride TEM Window Grid(9) 100μm sq.50nm10/pk76042-51Silicon Nitride TEM Window Grid1000μm sq.50nm10/pk76042-52Silicon Nitride TEM Window Grid500μm sq.50nm10/pk76042-53Silicon Nitride TEM Window Grid100μm sq.50nm10/pk