v\:* {behavior:url(#default#VML) }o\:* {behavior:url(#default#VML) }w\:* {behavior:url(#default#VML) }.shape {behavior:url(#default#VML) }LarryNormalLarry23972015-07-31T06:39:00Z2015-07-31T06:39:00Z15673233267379315.00CleanCleanfalse5.25 磅7.8 磅02falsefalsefalseEN-USZH-CNX-NONE/* Style Definitions */table.MsoNormalTable{mso-style-name:普通表格 mso-tstyle-rowband-size:0 mso-tstyle-colband-size:0 mso-style-noshow:yes mso-style-priority:99 mso-style-parent:"" mso-padding-alt:0cm 5.4pt 0cm 5.4pt mso-para-margin:0cm mso-para-margin-bottom:.0001pt mso-pagination:widow-orphan font-size:10.5pt mso-bidi-font-size:11.0pt font-family:"Calibri","sans-serif" mso-ascii-font-family:Calibri mso-ascii-theme-font:minor-latin mso-hansi-font-family:Calibri mso-hansi-theme-font:minor-latin mso-bidi-font-family:"Times New Roman" mso-bidi-theme-font:minor-bidi mso-font-kerning:1.0pt }table.MsoTableGrid{mso-style-name:网格型 mso-tstyle-rowband-size:0 mso-tstyle-colband-size:0 mso-style-priority:39 mso-style-unhide:no border:solid windowtext 1.0pt mso-border-alt:solid windowtext .5pt mso-padding-alt:0cm 5.4pt 0cm 5.4pt mso-border-insideh:.5pt solid windowtext mso-border-insidev:.5pt solid windowtext mso-para-margin:0cm mso-para-margin-bottom:.0001pt mso-pagination:widow-orphan font-size:10.5pt mso-bidi-font-size:11.0pt font-family:"Calibri","sans-serif" mso-ascii-font-family:Calibri mso-ascii-theme-font:minor-latin mso-hansi-font-family:Calibri mso-hansi-theme-font:minor-latin mso-bidi-font-family:"Times New Roman" mso-bidi-theme-font:minor-bidi mso-font-kerning:1.0pt }台式三维原子层沉积系统ALD原子层沉积(Atomic layer deposition, ALD)是通过将气相前驱体脉冲交替的通入反应器,化学吸附在沉积衬底上并反应形成沉积膜的一种方法,是一种可以将物质以单原子膜形式逐层的镀在衬底表面的方法。因此,它是一种真正的纳米技术,以控制方式实现纳米的超薄薄膜沉积。由于ALD利用的是饱和化学吸附的特性,因此可以确保对大面积、多空、管状、粉末或其他复杂形状基体的高保形的均匀沉积。 美国ARRADIANCE公司的GEMStar XT系列台式 ALD系统,在小巧的机身(78 x56 x28 cm)中集成了原子层沉积所需的所有功能,可多容纳9片8英寸基片同时沉积。GEMStar XT全系配备热壁,结合前驱体瓶加热,管路加热,横向喷头等设计, 使温度均匀性高达99.9%,气流对温度影响减少到0.03%以下。高温度稳定度的设计不仅实现在 8英寸基体上膜厚的不均匀性小于1%,而且更适合对超高长径比的孔径结构等3D结构实现均匀薄膜覆盖,可实现对高达1500:1长径比微纳深孔内部的均匀沉积。 SHAPE \* MERGEFORMAT GEMStar XT 产品特点:■ 300℃ 铝合金热壁,对流式温度控制■ 175℃ 温控150ml前驱体瓶,200℃ 控输运支管■ 可容纳多片4,6,8英寸样品同时沉积■ 可容纳1.25英寸/32mm厚度的基体■ 标准CF-40接口 ■ 可安装原位测量或粉末沉积模块等选件■ 等离子体辅助ALD插件■ 多种配件可供选择GEMStar XT 产品型号:GEMStar -4 XT:■ 大4英寸/100 mm基片沉积■ 单路前驱体输运支管, 4路前驱体瓶接口■ 不可升为等离子体增强ALDGEMStar -6/8 XT:■ 大6英寸(150mm)/8英寸(200mm)基片沉积■ 双路前驱体输运支管, 8路前驱体瓶和CF-40接口■ 可升为等离子体增强ALDGEMStar -8 XT-P: ■ 大8英寸/200mm基片沉积■ 双路前驱体输运支管, 8路前驱体瓶和CF-40接口■ 装备高性能ICP等离子发生器13.56 MHz 的等离子源非常紧凑,只需风冷,高运行功率达300W。■ 标配3组气流质量控制计(MFC)控制的等离子气源线,和一条MFC控制的运载气体线,使难以沉积的氧化物、氮化物、金属也可以实现均匀沉积。GEMStar NanoCUBE:* 大100 mm 立方体样品 沉积* 单路前驱体输运支管, 2路前驱体瓶接口* 主要用于3D多孔材料,以及厚样品的沉积 SHAPE \* MERGEFORMAT 丰富配件:多样品托盘:* 多样品夹具,样品尺寸(8", 6", 4")向下兼容。* 多基片夹具,多同时容纳9片基片。 温控热托盘:* 可加热样品托盘,高温度500℃,可实现热盘-热壁复合加热方式。粉末沉积盘: 臭氧发生器: 真空进样器(Load Lock) 晶振测厚仪 前驱体瓶: 前驱体加热套: 粉末旋转沉积罐模块:配合热壁加热方式,进一步实现对微纳粉末样品全保型薄膜均匀沉积包覆。 手套箱接口:可从侧面或背面接入手套箱,与从底部接入手套箱不同,不占用手套箱空间。由于主机在手套箱侧面,反应过程中不对手套箱有加热效应,不影响手套箱内温度。 应用案例 应用领域 国内外用户已发表文献1、 Loï c Assaud et al. Systematic increase of electrocatalytic turnover over nanoporous Pt surfaces Prepared by atomic layer deposition. J. Mater. Chem. A (2015) DOI: 10.1039/c5ta00205b2、 Xiangyi Luo et al. Pd nanoparticles on ZnO-passivated porous carbon by atomic layer deposition: an effective electrochemical catalyst for Li-O2 battery. Nanotechnology(2015) 26, 164003. DOI:10.1088/0957-4484/26/16/1640033、 HengweiWang, et al. Precisely-controlled synthesis of Au@Pd core– shell bimetallic catalyst via atomic layer deposition for selective oxidation of benzyl alcohol. Journal of Catalysis (2015) 324, 59– 68. DOI: 10.1016/j.jcat.2015.01.0194、 Sean W. Smith, et al. Improved oxidation resistance of organic/inorganic composite atomic layer deposition coated cellulose nanocrystal aerogels. J. Vac. Sci. Technol. A (2014) 4, 32 DOI: 10.1116/1.48822395、 Fatemeh Sadat MinayeHashemi et al. A New Resist for Area Selective Atomic and Molecular Layer Deposition on Metal− Dielectric Patterns. J. Phys. Chem. C (2014), 118, 10957− 10962. DOI: 10.1021/jp502669f6、 Jeffrey B. Chou, et.al Enabling Ideal Selective Solar Absorption with 2D Metallic Dielectric Photonic Crystals. Adv. Mater. (2014), DOI: 10.1002/adma.201403302.7、 Jin Xie, et al. Site-Selective Deposition of Twinned Platinum Nanoparticles on TiSi2 Nanonets by Atomic Layer Deposition and Their Oxygen Reduction Activities. ACS Nano (2013), 7, 6337– 6345. DOI: 10.1021/nn402385f8、 Pengcheng Dai, et al. Solar Hydrogen Generation by Silicon Nanowires Modified with Platinum Nanoparticle Catalysts by Atomic Layer Deposition. Angew. Chem. Int. Ed. (2013), 52, 1 – 6. DOI: 10.1002/anie.2013038139、 Joseph Larkin et al. Slow DNA Transport through Nanoporesin Hafnium Oxide Membranes. ACS Nano (2013), 11, 10121– 10128. DOI: 10.1021/nn404326f10、 Thomas M et al. Extended lifetime MCP-PMTs: Characterization and lifetime measurements of ALD coated microchannel plates, in a sealed photomultiplier tube Nuclear Instruments and Methods in Physics Research A (2013) 732, 388– 391. DOI: 10.1016/j.nima.2013.07.02311、 Kevin J. Maloney et al. Microlattices as architected thin films: Analysis of mechanical properties and high strain elastic recovery. APL Mater. 1, 022106 (2013) DOI: 10.1063/1.481816812、 Sean W. Smith et al. Improved Temperature Stability of Atomic Layer Deposition Coated Cellulose Nanocrystal Aerogels. Mater. Res. Soc. Symp. Proc. (2012) DOI: 10.1557/opl.2012.
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