仪器简介: 美国MTI公司为半导体行业硅片几何参数测量技术-电容探头领域的佼佼者,与昔日的ADE齐名:为世界半导体业硅片几何参数测量的标准测试设备;为纳斯达克上市企业。 主要参数: 1. Diameter: 150mm,200mm,300mm 2. Material: All semiconducting,and semi-insulating matrrials 3.Surfaces: As-Cut, Lapped, Etched,Polished,Patterned Bare wafer/Quartz Base,Tape 4.Thickness: (ASTM F533),Range-+/-500um Accracy-+/-0.25um Repeatability-0.050um 5.TTV: (ASTM F533) Range-+/-500um Accuracy-+/-0.050um Repeatablity-0.050um 6.Bow:(ASTM F1390) Range-+/-250um Accuracy-+/-2.0um Repeatabiligy-0.75um 7.Flatness(Global)(ASTM F1530) Rang:8mm Accuracy-+/-0.05um Repeatbility-0.030um 8.Flatness(Site)(ASTM F1530) Rang:8mm Accuracy: +/-0.05um Repeatbiligy:0.030um设备:Proforma 300SA:半自动大12寸晶圆几何参数测量仪;Proforma 200SA:半自动型大8寸晶圆几何参数测试仪; 测试数据/结果例子:23-Sep-2013 Wafer Summary Report Page:1.00 Operator: Administrator Lot Number:DK Wafer 200mm Passed:4 Measurement Date:09/23/2013 Recipe: 200mm,33,m,1notch,1-29-13 1 run Failed:0 Measurement Time:17:51:58 Yield:100.0% WaferWafer CenterAvgMinMax 3PTLSQ3PTLSQ MaxMaxMaxMaxMaxMaxMaxMax% SitesNumberIDThicknessThicknessThicknessThicknessTTVBowBowWarpWarpSoriGBIRGF3RGFLRGBIDGF3DGFLDSBIRSF3RSFLRSFQRSBIDSF3DSFLDSFQDPassed (uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM)(uM) Low Limit High Limit 1.00shiny side729.56729.15728.83729.650.82-0.20-2.2118.3217.7417.720.820.760.750.820.630.480.290.300.300.130.210.200.200.07100.002.00dull side729.60729.14728.77729.730.963.855.5917.3417.3217.560.960.770.770.960.640.540.320.340.340.190.260.250.250.13100.003.00shiny side729.52729.10728.77729.610.840.33-1.5516.7517.3017.270.840.750.740.840.610.480.340.330.330.130.190.190.190.09100.004.00dull side729.54729.10728.76729.680.923.295.3417.2117.2917.530.920.790.760.920.610.530.290.270.280.180.270.260.260.10100.00 Minimum729.52729.10728.76729.610.82-0.20-2.2116.7517.2917.270.820.750.740.820.610.480.290.270.280.130.190.190.190.07100.00 Maximum729.60729.15728.83729.730.963.855.5918.3217.7417.720.960.790.770.960.640.540.340.340.340.190.270.260.260.13100.00 Average729.56729.12728.78729.670.891.821.7917.4117.4117.520.890.770.760.890.620.510.310.310.310.160.230.230.230.10100.00 Std Dev0.0300.0220.0280.0440.0561.7723.6810.5730.1900.1620.0560.0150.0120.0560.0140.0250.0220.0290.0250.0250.0320.0290.0300.0210.000 200SA/300SA操作界面,3D图形貌显示技术参数: 1. Diameter: 150mm,200mm,300mm 2. Material: All semiconducting,and semi-insulating matrrials 3.Surfaces: As-Cut, Lapped, Etched,Polished,Patterned Bare wafer/Quartz Base,Tape 4.Thickness: (ASTM F533),Range-+/-500um Accracy-+/-0.25um Repeatability-0.050um 5.TTV: (ASTM F533) Range-+/-500um Accuracy-+/-0.050um Repeatablity-0.050um 6.Bow:(ASTM F1390) Range-+/-250um Accuracy-+/-2.0um Repeatabiligy-0.75um 7.Flatness(Global)(ASTM F1530) Rang:8mm Accuracy-+/-0.05um Repeatbility-0.030um 8.Flatness(Site)(ASTM F1530) Rang:8mm Accuracy: +/-0.05um Repeatbiligy:0.030um主要特点: 1. Diameter: 150mm,200mm,300mm 2. Material: All semiconducting,and semi-insulating matrrials 3.Surfaces: As-Cut, Lapped, Etched,Polished,Patterned Bare wafer/Quartz Base,Tape 4.Thickness: (ASTM F533),Range-+/-500um Accracy-+/-0.25um Repeatability-0.050um 5.TTV: (ASTM F533) Range-+/-500um Accuracy-+/-0.050um Repeatablity-0.050um 6.Bow:(ASTM F1390) Range-+/-250um Accuracy-+/-2.0um Repeatabiligy-0.75um 7.Flatness(Global)(ASTM F1530) Rang:8mm Accuracy-+/-0.05um Repeatbility-0.030um 8.Flatness(Site)(ASTM F1530) Rang:8mm Accuracy: +/-0.05um Repeatbiligy:0.030um
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