仪器简介：
REX-4是广泛用于半导体材料清洗的真空紫外光源系统，它采用射频激发氙气产生158nm到190nm的真空紫外光，峰值波长在172nm,可靠性高，无需维护。REX-4标准产品带有350 x 400 mm 的法兰，光源口径230 mm，可以根据用户需要定制法兰或光源口径。
我们还提供表面清洁程度测试控制的仪器TUCS: http://www.instrument.com.cn/netshow/SH101397/C30750.htm
应用领域：
半导体
半导体基片和光刻薄膜的清洗 Dry cleaning surface of silicon wafers and photo-resist films
干刻清洗光刻掩模Dry cleaning lithography masks
后CMP清洗 Post CMP dry cleaning
高K材料的表面处理 Surface conditioning of high K materials
紫外清洗层间绝缘 UV dry cleaning of interlayer dielectric (SOG)
光学化学气相沉积 Optical chemical vapor deposition (CVD)
PMMA强化 PMMA conditioning (resist smoothing)
半导体晶圆切割后清洗 Post dicing dry cleaning of tape residues
焊接前清洗 Pre-wire bonding dry cleaning
引线架清洗 Dry cleaning of backside of lead frames
等离子体显示
光刻或镀膜前清洗 Pre-photo-resist, Pre-sputtering dry cleaning
湿法清洗前后的干刻清洗Dry cleaning before and after wet cleaning to improve yield
PDP荧光测试系统 PDP phosphor evaluation systems using Excimer lamps and fiber optic UV delivery systems
环境和医疗
有毒废物处理 Toxic waste (e.g. CFC's, PCB's, dioxin's, trichloroethylene) destruction in air/water streams by photo-oxidation
机械零件的干洗 Non solvent cleaning: of mechanical parts
医疗器械的紫外和臭氧消毒UV/Ozone sterilization of medical instruments and medical supplies
清洗玻璃板，PDP荧光灯和液晶显示器 Cleaning glass boards, PDP Fluorescent light and LCD
其它
光刻薄膜的曝光修补Improvement for non-exposed part surface of photo-resist film
软灰化Soft-Ashing
碟片表面处理 Pre-treatment of disc surfaces, i.e., CD and DVD
硬盘中轴承的干洗 Dry cleaning ball bearings for hard disk drives
等离子刻蚀的辅助灯 Igniter and stabilizer for plasma etcher (Excimer used as an assist light)
CMP后处理 Post-process treatment of CMP hardening of coatings and adhesives
非晶态材料的生成 Generation of amorphous material, such as amorphous silicon solar cell
印刷 Printing - textile printing, finishing, printed circuits
表面改性 Reforming surfaces - ceramics, surface etching
环境清洁 Environmental CLEAN UP
技术参数：
峰值波长：172nm
波长范围：158nm到190nm
臭氧发生速度：400秒内产生1克臭氧
主要特点：
1.技术成熟可靠
2.产品使用简单，无需维护
3.可按用户要求定制。
