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组件类别： 光学元件
Alluxa高性能滤光片以先进的设计工艺和镀膜过程控制,使Alluxa滤光片具有行业内极高的透过率,极高的截*深度和波长精确性,其中通过SIRRUS™离子束沉积硬镀膜技术,也使得Alluxa滤光片具有使用寿命长,高损伤阈值,以及极高的批次稳定性等特点,并已经广泛应用于生物荧光系统、拉曼系统、量子、雷达通讯等精密光学系统中.
Alluxa除了丰富的标准品,同时提供定制服务,并且定制成本在行业内有相当大的竞争力.
Alluxa二向色镜介绍(45°入射)
图1.用于荧光显微镜应用的超陡，高透射长通二向色分光镜。
ULTRA系列薄膜二向色滤光片的陡峭边缘，99%透射率和99.5%反射率都可以实现*小的光强损失和*佳的仪器性能。每个ULTRA系列二向色滤光片，多色滤光片，二向色分光镜或光束合成器都可以抵抗激光损伤，并且可以设计成在任何角度工作。它们都非常适用于荧光显微镜，流式细胞仪和拉曼光谱等应用。
ULTRA系列多色滤光片采用梳状设计，多个透射带由多个反射带隔开。在荧光应用中，这允许来自几个不同荧光团的发射光同时被引导*检测器，同时激发光被引导*样品。
带有5个透射波段的ULTRA系列多色分束器全部由反射波段分隔。
根据系统的波长范围和要求，ULTRA系列二向色或多色滤光片可以定制设计，以满足以下一个或多个具有挑战性的规格：
●透过率可达99%
●Up to 99% transmission
●反射率可达99.5%
●Up to 99.5% reflection
●波长误差±0.5% Edge wavelength
●Tolerances as tight as ± 0.5% of edge wavelength
●波长范围UV to IR可选
●Edge wavelengths from the UV to the mid IR
●陡度：1% Edge wavelength @10%T～90%T
●Edge transitions as steep as 1% of edge wavelength from 10% T to 90% T
●透过波前差(RMS)：极优0.01λ per inch @ 632.8 nm
●TWE as low as 0.01 wave RMS / inch measured at 632.8 nm
应用：荧光显微镜成像、流式细胞仪、拉曼光谱等.
用于成像和激光应用的超平坦二向色镜
图3.采用Alluxa低应力工艺制造的超平0.5mm厚二向色滤光片。
所有ULTRA系列二向色和多色滤光片均可定制为超平面滤光片，以*大限度地减少失真并保持成像和基于激光的荧光系统的*佳性能。将超平面二色性纳入这些系统将产生清晰的图像，*小的焦点位移和准确量化目标分子。当在632.8nm处测量时，可以定制超平坦二向色滤光片，其具有优于0.1波长PV /英寸的平坦度。
创新的薄膜工艺使产品质量一致性
图4. ULTRA系列滤光片的波长控制，传输和截*在几种不同的涂层运行中具有高度可重复性。
Alluxa薄膜滤光片和介质反射镜均采用我们的SIRRUS™离子束沉积硬镀膜技术，这使我们能够在多个不同的涂层运行中可靠地重复生产相同的高性能薄膜带通滤波器，这意味着您的所有系统性能始终如一。
Alluxa多波长截止二向色分束镜
504_605 ULTRA Dualband Dichroic Beamsplitter | |
Item Number | 7178 |
Angle of Incidence | 45 Degrees |
Cut-On Wavelength | 504 nm ± 3.0 nm, 605 nm ± 4.0 nm |
Transmission Band(s) | 509 to 540 nm > 93% T Average, 614 to 700 nm > 93% T Average |
Reflection Band(s) | 400 to 495 nm > 95% R Average, 569 to 596 nm > 95% R Average |
Parallelism | < 3.0 Arcseconds |
Transmitted Wavefront Error | < 0.25 Wave RMS @ 632.8nm |
Substrate Type | Fused Silica |
Dimensions | 25.2x35.6 mm |
Filter Thickness | 1.05 mm |
Assembly Type | Unmounted |
402_502 ULTRA Dualband Dichroic Beamsplitter | |
Item Number | 7169 |
Angle of Incidence | 45 Degrees |
Cut-On Wavelength | 402 nm ± 3.0 nm, 502 nm ± 3.0 nm |
Transmission Band(s) | 409 to 451 nm > 93% T Average, 509 to 700 nm > 93% T Average |
Reflection Band(s) | 325 to 395 nm > 95% R Average, 465 to 495 nm > 95% R Average |
Parallelism | < 3.0 Arcseconds |
Transmitted Wavefront Error | < 0.25 Wave RMS @ 632.8nm |
Substrate Type | Fused Silica |
Dimensions | 25.2x35.6 mm |
Filter Thickness | 1.05 mm |
Assembly Type | Unmounted |
411_505_582_669_763 ULTRA Pentaband Dichroic Beamsplitter | |
Item Number | 7206 |
Angle of Incidence | 45 Degrees |
Cut-On Wavelength | 411 nm ± 3.0 nm, 505 nm ± 3.0 nm, 582 nm ± 3.0 nm, 669 nm ± 4.0 nm, 763 nm ± 4.0 nm |
Transmission Band(s) | 417 to 459 nm > 93% T Average, 513 to 529 nm > 93% T Average, 592 to 616 nm > 93% T Average, 681 to 727 nm > 93% T Average, 772 to 848 nm > 93% T Average |
Reflection Band(s) | 200 to 402 nm > 95% R Average, 476 to 495 nm > 95% R Average, 548 to 571 nm > 95% R Average, 638 to 657 nm > 95% R Average, 746 to 752 nm > 95% R Average |
Parallelism | < 3.0 Arcseconds |
Transmitted Wavefront Error | < 0.25 Wave RMS @ 632.8nm |
Substrate Type | Fused Silica |
Dimensions | 25.2x35.6 mm |
Filter Thickness | 1.05 mm |
Assembly Type | Unmounted |
498_653 ULTRA Dualband Dichroic Beamsplitter | |
Item Number | 7119 |
Angle of Incidence | 45 Degrees |
Cut-On Wavelength | 498 nm ± 3.0 nm, 653 nm ± 4.0 nm |
Transmission Band(s) | 505 to 570 nm > 93% T Average, 663 to 850 nm > 93% T Average |
Reflection Band(s) | 350 to 491 nm > 95% R Average, 600 to 643 nm > 95% R Average |
Parallelism | < 3.0 Arcseconds |
Transmitted Wavefront Error | < 0.25 Wave RMS @ 632.8nm |
Substrate Type | Fused Silica |
Dimensions | 25.2x35.6 mm |
Filter Thickness | 1.05 mm |
Assembly Type | Unmounted |
458_532_597 ULTRA Triband Dichroic Beamsplitter | |
Item Number | 7192 |
Angle of Incidence | 45 Degrees |
Cut-On Wavelength | 458 nm ± 3.0 nm, 532 nm ± 3.0 nm, 597 nm ± 3.0 nm |
Transmission Band(s) | 463 to 487 nm > 93% T Average, 537 to 549 nm > 93% T Average, 602 to 662 nm > 93% T Average |
Reflection Band(s) | 400 to 453 nm > 95% R Average, 497 to 527 nm > 95% R Average, 557 to 592 nm > 95% R Average, 672 to 900 nm > 95% R Average |
Parallelism | < 3.0 Arcseconds |
Transmitted Wavefront Error | < 0.25 Wave RMS @ 632.8nm |
Substrate Type | Fused Silica |
Dimensions | 25.2x35.6 mm |
Filter Thickness | 1.05 mm |
Assembly Type | Unmounted |
501_591 Dualband Dichroic Beamsplitter | |
Item Number | 7091 |
Angle of Incidence | 45 Degrees |
Cut-On Wavelength | 501 nm ± 3.0 nm, 591 nm ± 3.0 nm |
Transmission Band(s) | 508 to 539 nm > 93% T Average, 600 to 682 nm > 93% T Average |
Reflection Band(s) | 450 to 495 nm > 95% R Average, 554 to 580 nm > 95% R Average |
Parallelism | < 3.0 Arcseconds |
Transmitted Wavefront Error | < 0.25 Wave RMS @ 632.8nm |
Substrate Type | Fused Silica |
Dimensions | 25.2x35.6 mm |
Filter Thickness | 1.05 mm |
Assembly Type | Unmounted |
558_658 ULTRA Dualband Dichroic Beamsplitter | |
Item Number | 7181 |
Angle of Incidence | 45 Degrees |
Cut-On Wavelength | 558 nm ± 3.0 nm, 658 nm ± 4.0 nm |
Transmission Band(s) | 564 to 592 nm > 93% T Average, 665 to 725 nm > 93% T Average |
Reflection Band(s) | 470 to 547 nm > 95% R Average, 615 to 646 nm > 95% R Average |
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企业名称
努美（北京）科技有限公司
企业信息已认证
企业类型
有限责任公司(自然人独资)
信用代码
911101070695525752
成立日期
2013-06-04
注册资本
1000万元
经营范围
技术开发、技术推广、技术转让、技术咨询、技术服务;销售实验室设备、仪器仪表、照明器具、光学仪器、电子产品、计算机、软件及辅助设备、机械设备、文化用品:维修计算机、仪器仪表:代理进出口、货物进出口、技术进出口。(市场主体依法自主选择经营项目,开展经营活动;依法须经批准的项目,经相关部门批准后依批准的内容开展经营活动;不得从事国家和本市产业政策禁止和限制类项目的经营活动。)
努美（北京）科技有限公司
公司地址
北京市石景山区鲁谷路51号院泰禾长安中心3号楼A塔12层1208
客服电话
公司名称： 努美（北京）科技有限公司
公司地址： 北京市石景山区鲁谷路51号院泰禾长安中心3号楼A塔12层1208 联系人： 努美科技 邮编： 100040 联系电话： 400-860-5168转4184
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