简介:The Plasma Prep™ X utilizes an anisotropic, parallel plate design to eliminate “undercutting” samples during the etching process. The system incorporates solid-state technology, an integrated vacuum gauge, and dual简介:The Plasma Prep™ X utilizes an anisotropic, parallel plate design to eliminate “undercutting” samples during the etching process. The system incorporates solid-state technology, an integrated vacuum gauge, and dual gas inputs for precise gas blending.详细>