简介:Delivers reactive species to the substrate, with a uniform high conductance path through the chamber, allowing a high gas flow to be used while maintaining low pressure
Electrodes available for temperatures from -150简介:Delivers reactive species to the substrate, with a uniform high conductance path through the chamber, allowing a high gas flow to be used while maintaining low pressure
Electrodes available for temperatures from -150ºC to +400ºC with helium backside cooling and a range mechanical clamp designs
? Optimised hardware and control to deliver processes requiring fast process step switching, e.g. Bosch
Variable height electrode can utilise the 3-dimensional characteristics of the plasma and accommodate substrates up to 10mm thick at optimum height
Range of ICP source diameters; 65mm, 180mm and 300mm
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