电镜光阑 65020 Top Hat Apertures 3.04mm Base O.D., 2mm Hat O.D. x 1mm thick

High quality apertures, specially designed for use in scanning and transmission electron microscopes (SEM, FESEM and TEM), Microprobe systems, Focused Ion Beam (FIB) and X-ray systems. Made with high precision drilled holes and with optimized shape to avoid scattering. The apertures are made to tight tolerances conforming original equipment manufacturers designs, pre-cleaned and individually packed. The apertures are either used as spray apertures in electron beam columns, limiting apertures or final apertures for objective lenses equipped with an aperture changer. Available in Pt/Ir (95:5%), Mo and Au (for some apertures). The Pt/Ir apertures can be cleaned using aperture flaming or heating devices. Molybdenum apertures stored at atmospheric conditions will oxidize rapidly, we can only guarantee Mo apertures for 4-6 weeks. The smallest hole for Pt/Ir apertures is 5µm, for Mo apertures it is 10µm. Apertures are available for all current brands of EM system manufacturers: FEI/Philips, JEOL, Hitachi, ZEISS/LEO, Cameca, Topcon, Tescan and CamScan. We also carry aperture sizes used for brands which are no longer manufactured but still in use: ISI/ABT, Cambridge Instruments/Leica, Siemens, BalScan, ETEC/Autoscan, SEMCO/ZEISS Novascan and Nanolab. Please see design and specifications below the selection table.

电镜光阑 65020 Top Hat Apertures 3.04mm Base O.D., 2mm Hat O.D. x 1mm thick信息由广州竞赢化工科技有限公司为您提供，如您想了解更多关于电镜光阑 65020 Top Hat Apertures 3.04mm Base O.D., 2mm Hat O.D. x 1mm thick报价、型号、参数等信息，欢迎来电或留言咨询。

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