Single layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms. Our h-BN CVD process has been adopted in order that defect density has been kept low (~1E10-1E11 cm-2) and single domain sizes have been increased to reduce 1D grain boudary defect concentrations. Monolayer h-BN sheets measure ~5cm x 5cm or ~2x2 inches in size.
Properties of h-BN
CVD 2x2 inches monolayer hBN CVD铜基单层氮化硼薄膜信息由上海巨纳科技有限公司为您提供,如您想了解更多关于CVD 2x2 inches monolayer hBN CVD铜基单层氮化硼薄膜报价、型号、参数等信息,欢迎来电或留言咨询。
除供应CVD 2x2 inches monolayer hBN CVD铜基单层氮化硼薄膜外,上海巨纳科技有限公司还可为您提供高纯度微粉化片状石墨(10微米,99%,1千克)、VSe2 二硒化矾晶体 (Vanadium Diselenide)、硒化铁碲等产品,公司有专业的客户服务团队,是您值得信赖的合作伙伴。