【序号】：1
【作者】： G.M. Mikhailov, P.V. Bulkin, S.A. Khudobin, A.A. Chumakov, S.Yu. Shapoval
【题名】：XPS investigation of the interaction between ECR-excited hydrogen and the native oxide of GaAs (100)
【期刊】：Vacuum
【年、卷、期、起止页码】：Volume 43, Issue 3, March 1992, Pages 199-201
【全文链接】：http://www.sciencedirect.com/science/article/pii/0042207X9290261T
【序号】：2
【作者】： Takeshi Kikawa  Isao Ochiai, Shinichiro Takatani
【题名】：Atomic hydrogen cleaning of GaAs and InP surfaces studied by photoemission spectroscopy
【期刊】：Surface Science
【年、卷、期、起止页码】：Volume 316, Issue 3, 10 September 1994, Pages 238-246
【全文链接】：http://www.sciencedirect.com/science/article/pii/0039602894912165
【序号】：3
【作者】： Masahiro Yoshimoto, Kenji Takubo, Michio Komoda, Hiroyuki Matsunami
【题名】：Gas phase reactions diagnosed by mass analysis in photo-assisted chemical vapor deposition of silicon nitride
【期刊】：Applied Surface Science
【年、卷、期、起止页码】：Volumes 79-80, 2 May 1994, Pages 264-269
【全文链接】：http://www.sciencedirect.com/science/article/pii/0169433294904200
【序号】：4
【作者】： Y.I. Nissim, J.M. Moison, F. Houzay, F. Lebland, C. Licoppe, M. Bensoussan
【题名】：Photo-assisted deposition of thin films on III-V semiconductors with UV and IR lamps
【期刊】：Applied Surface Science
【年、卷、期、起止页码】：Volume 46, Issues 1-4, 2 December 1990, Pages 175-188
【全文链接】：http://www.sciencedirect.com/science/article/pii/016943329090139Q
【序号】：5
【作者】： Olivier Dulac, Yves I. Nissim
【题名】：Integration of plasma cleaning and light-assisted CVD for the passivation of III-V semiconductor surfaces
【期刊】：Microelectronic Engineering
【年、卷、期、起止页码】：Volume 25, Issues 2-4, August 1994, Pages 265-275
【全文链接】：http://www.sciencedirect.com/science/article/pii/0167931794900256