[序号]：1
[作者]：Thornton J A
[题名]：Internal stresses in amprphous silicon films deposited by cylindrical magnetron sputting using Ne, Ar, Kr, Xe, and Ar+H2
[期刊]：Journal of vacuum science and technology[年、卷、期、起止页码]：1981, 18(2), 203-207[全文链接]http://ieeexplore.ieee.org/xpl/login.jsp?tp=&arnumber=4954146&url=http%3A%2F%2Fieeexplore.ieee.org%2Fiel5%2F4915518%2F4954130%2F04954146.pdf%3Farnumber%3D4954146
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