【序號】：1

【作者】：Vladimir I. Kolobov

【篇名】：Fokker–Planck modeling of electron kinetics in plasmas and semiconductors

【期刊】： Computational Materials Science

【全文連接】：http://www.sciencedirect.com/science/article/pii/S0927025603001150

【序號】：2

【作者】：M Baeva and D Uhrlandt

【篇名】：Non-equilibrium simulation of the spatial and temporal behavior of a magnetically rotating arc in argon

【期刊】： Plasma Sources Science and Technology

【全文連接】：http://iopscience.iop.org/0963-0252/20/3/035008

【序號】：3

【作者】：Rauf, S.;  Kushner, M.J.; 

【篇名】：Virtual plasma equipment model: a tool for investigating feedback control in plasma processing equipment

【期刊】： Semiconductor Manufacturing, IEEE Transactions on

【全文連接】：http://ieeexplore.ieee.org/xpl/freeabs_all.jsp?arnumber=705383

【序號】：4

【作者】：Mark J Kushner 

【篇名】：Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design

【期刊】： Journal of Physics D: Applied Physics

【全文連接】：http://iopscience.iop.org/0022-3727/42/19/194013

【序號】：5

【作者】：E. A. Bogdanov, A. A. Kudryavtsev, L. D. Tsendin, R. R. Arslanbekov and V. I. Kolobov

【篇名】：Nonlocal phenomena in the positive column of a medium-pressure glow discharge

【期刊】： GAS DISCHARGES, PLASMA

【全文連接】：http://www.springerlink.com/content/513760715012183n/