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【序號】:1
【作者】:H. Kupfer and F. Richter
【篇名】:Reactive Magnetron Sputtering of Indium Tin Oxide Thin Films: The Cross-Corner and Cross-Magnetron Effect
【期刊】:REACTIVE SPUTTER DEPOSITION,Springer Series in Materials Science, 2008, Volume 109, 337-36
【全文連接】:http://www.springerlink.com/content/q0p4033jmp1337k5/
【序號】:2
【作者】:Ronny Kleinhempel, Benjamin Graffel, Jan Lukas, Hartmut Kupfer, Thoralf Dunger, Thomas Welzel, Frank Richter
【篇名】:The Influence of Cross-Magnetron Effect on the Properties of Indium Tin Oxide Thin Films Deposited by Pulsed Dual Magnetron Discharges
【期刊】:Tenth International Conference on Plasma Surface Engineering (PSE2006)
Volume 4, Issue Supplement 1, pages S325–S329, April 2007
【全文連接】:http://onlinelibrary.wiley.com/doi/10.1002/ppap.200730902/abstract