【序號】：1

【作者】：H. Kupfer and F. Richter

【篇名】：Reactive Magnetron Sputtering of Indium Tin Oxide Thin Films: The Cross-Corner and Cross-Magnetron Effect

【期刊】：REACTIVE SPUTTER DEPOSITION,Springer Series in Materials Science, 2008, Volume 109, 337-36       

【全文連接】：http://www.springerlink.com/content/q0p4033jmp1337k5/

【序號】：2

【作者】：Ronny Kleinhempel, Benjamin Graffel, Jan Lukas, Hartmut Kupfer, Thoralf Dunger, Thomas Welzel, Frank Richter

【篇名】：The Influence of Cross-Magnetron Effect on the Properties of Indium Tin Oxide Thin Films Deposited by Pulsed Dual Magnetron Discharges

【期刊】：Tenth International Conference on Plasma Surface Engineering (PSE2006)

Volume 4, Issue Supplement 1, pages S325–S329, April 2007

【全文連接】：http://onlinelibrary.wiley.com/doi/10.1002/ppap.200730902/abstract